Showing posts with label Engineering. Show all posts
Showing posts with label Engineering. Show all posts

NanoES seminar

Join us every Thursday for the NanoES seminar (https://www.nano.uw.edu/home/news-and-events/events/):

CEO of Zyvex Labs

John Randall

Digital Atomic-Scale Fabrication: A new approach to Atomically Precise Manufacturing

OSU Student

Tyler McCrea

Applying PbSe Colloidal Quantum Dots to Semiconductor Radiation Detection Devices

University of Ottawa

Adina Luica-Mayer

Quantum materials at the atomic scale

TBD

TBD

TBD

Penn State University

Yu-Chuan Lin

Synthesis and processing of two-dimensional semiconductors by controllable thin-film approaches

UW Faculty

David Masiello

TBD

Special Guest, Texas Instruments

Luigi Colombo

Two-dimensional Materials: from thin film growth to devices

UW Students

Zheyi Han, Quentin Tanguy

TBD

UW Student

Jinrong Ma (UW)

TBD

 

Digital Atomic-Scale Fabrication:

A new approach to Atomically Precise Manufacturing

John N. Randall

Zyvex Labs, Richardson Texas

Selected Publications


• Recombination kinetics and effects of superacid treatment in sulfur and selenium based transition metal dichalcogenides. M. Amani, R. Addou, G. H. Ahn, D. Kiriya, P Taheri, D.-H. Lien, J. W. Ager, R. M. Wallace, and Ali Javey. Nano Lett., 16 (4), 2786–2791 (2016)

• Surface defects on natural MoS2.
R. Addou, L. Colombo and R. M. Wallace.
ACS Appl. Mater. Interfaces, 7, 11921-11929 (2015)

• The Influence of Hydroxyls on Pd-Atom Mobility and Clustering on Rutile-TiO2(011)-2×1. R. Addou, T. P. Senftle , N. O'Connor, M. J. Janik , A. C.T. van Duin, and Matthias Batzill.
ACS Nano, 8 (6), 6321–6333 (2014)

• Defect-dominated doping and contact resistance in MoS2. S. McDonnell, R. Addou, C. Buie, R. M. Wallace, C. L. Hinkle.
ACS Nano, 8 (3), pp 2880–2888 (2014)

• Growth of a two dimensional dielectric monolayer on quasi-freestanding graphene.
R. Addou, A. Dahal and M. Batzill.
Nature Nanotechnology 8, 41-45 (2013)

• Monolayer graphene growth on Ni(111) by low temperature chemical vapor deposition.
R. Addou, A. Dahal, P. Sutter and M. Batzill.
Appl. Phys. Lett. 100 021601 (2012)

• Structure Investigation of the (100) surface of the orthorhombic Al13Co4 crystal.
R. Addou, E. Gaudry, T. Deniozou, M. Heggen, M. Feuerbacher, P. Gille, R. Widmer, O. Groening, V. Fournée, Y. Grin, J. M. Dubois, and J. Ledieu.
Phys. Rev. B 80 014203 (2009)